Landfill gases contain numerous contaminants, but one group has demonstrated a promising new application of plasma technology capable of removing such compounds. Researchers have demonstrated an experimental plasma device capable of cleaning gas samples of D4, one of the most common siloxanes. Drawing on a technique for creating plasma called dielectric barrier discharge, the group was able to significantly reduce the amount of D4 samples after treating it with a helium-based plasma.
from Latest Science News -- ScienceDaily https://ift.tt/2qzdqqx
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